PESM 2026 is the 16th event in a series devoted to plasma etch and strip processes for micro-, nano- and bio-technologies. This workshop will be held in June 2026 in Grenoble (France).
The objective of the workshop is to provide a forum for open discussions between science and technology. It is not only dedicated to scientists, process engineers and Ph-D students, but also to industrial partners in the field of dry etching, including plasma processing but also other vacuum-based removal techniques (ion beam, neutral beam, gaseous thermal etching, etc...) and cleaning processes (study of dry-wet interactions, collapse in nanostructures, charging and corrosion issues…). Topics may include both fundamental and applied research highlights, as well as issues related to the introduction of new technologies into manufacturing.
PESM 2026 will focus on plasma etching and cleaning challenges: 1) in advanced CMOS, memory and quantum technologies (GAA Nanowire Transistors, OXRAM, PCRAM, MRAM, FeRAM...), 2) in more than Moore applications (MEMS, photonics, Imagers, Power, LED, Solar Cells…). It will be also dedicated to emerging plasma etching concepts and technology (ALE, TSD, Isotropic Etching, cryogeny...) and the fundamental aspects of plasmas (new plasma sources, Diagnostics, Modeling, Machine learning ...). A new session dedicated to sustainable processes is also planned this year.
To stimulate technical discussions, invited talks will be given by scientific and technical leaders of the etch community, in each of the key areas defined above.